Optics: measuring and testing – Standard
Patent
1992-12-28
1995-01-17
Rosenberger, Richard A.
Optics: measuring and testing
Standard
356237, 356394, G01J 102, G01N 2188
Patent
active
053830180
ABSTRACT:
A calibration wafer for a patterned wafer scanner is constructed from a substrate of semiconductor material, typically silicon, in which a pattern of features has been etched into the periphery of each die by means of photolithographic techniques. Next, a layer or layers of films composed of materials which are typically used during the fabrication of integrated circuits are deposited. Then a substantially uniform distribution of particles of a known material and size distribution is deposited onto the wafer. A second embodiment of the calibration wafer is one in which a layer or layers of film are first deposited onto a substrate. Then a pattern of features is etched into the periphery of the film covering each die by means of photolithographic techniques. After this step, a substantially uniform distribution of particles is deposited. A method of using such a calibration wafer to calibrate a patterned wafer scanner is also disclosed.
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National Semiconductor Corporation
Pham Hoa Q.
Rosenberger Richard A.
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