Optics: measuring and testing – Lamp beam direction or pattern
Patent
1993-11-30
1996-02-27
Pham, Hoa O.
Optics: measuring and testing
Lamp beam direction or pattern
4251744, G01J 100, B28B 1700
Patent
active
054953286
ABSTRACT:
An apparatus and a method for calibrating and normalizing a stereolithographic apparatus so that a reaction means directed by a positioning means supplied with positioning means information may be positioned accurately on a designated surface of a working medium. One or more sensors fixed in location with respect to the designated surface of the working medium are utilized to correlate positioning means information with specific locations on the designated surface of the working medium. Other locations intermediate the specific locations may then be determined by the technique of linear interpolation.
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Almquist Thomas A.
Juran Warren
Spence Stuart T.
Tarnoff Harry L.
3-D Systems, Inc.
Pham Hoa O.
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