Coating apparatus – With vacuum or fluid pressure chamber
Reexamination Certificate
2005-01-25
2005-01-25
Edwards, Laura (Department: 1734)
Coating apparatus
With vacuum or fluid pressure chamber
C118S052000, C118S319000, C118S320000
Reexamination Certificate
active
06846360
ABSTRACT:
An apparatus and method which is suitable for the bubble-free application of a resin to a substrate. The apparatus typically includes an airtight chamber which receives the substrate and a resin dispenser for dispensing the liquid resin onto the substrate. After a vacuum pressure is induced in the chamber, the resin is dispensed onto the substrate. Accordingly, air is substantially incapable of becoming trapped between the resin and the substrate and forming air bubbles during subsequent processing of the substrate.
REFERENCES:
patent: 4990208 (1991-02-01), Kano
patent: 6063190 (2000-05-01), Hasebe et al.
patent: 6627038 (2003-09-01), Nakahara
Aptos Corporation
Edwards Laura
Tung & Associates
LandOfFree
Apparatus and method for bubble-free application of a resin... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus and method for bubble-free application of a resin..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for bubble-free application of a resin... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3437655