Apparatus and method for blocking the deposition of oxide on a w

Details Apparatus and method for blocking the deposition of oxide on a w Apparatus and method for blocking the deposition of oxide on a w

1998-12-03

2000-09-19

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Having means to expose a portion of a substrate to coating...

118728, C23C 1600

Patent

active

061206075

ABSTRACT:
An apparatus for use in the deposition of oxide on a wafer, the apparatus including a chamber for receiving oxygen gas that is used for forming the oxide on the wafer, the apparatus comprising: a wafer chuck located within the chamber, the wafer chuck capable of supporting the wafer during the deposition of oxide on the wafer; and an oxide blocking member located within the chamber and detached from the wafer, the oxide blocking member capable of preventing the deposition of oxide in at least one predetermined area of the wafer.

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patent: 5614446 (1997-03-01), Ramaswami et al.
patent: 5922133 (1999-07-01), Tepman

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