Apparatus and method for analyzing surface

Details Apparatus and method for analyzing surface Apparatus and method for analyzing surface

1995-02-16

1997-07-22

Anderson, Bruce

Radiant energy

Ionic separation or analysis

With sample supply means

250305, 250282, 378 53, B01D 5944, H01J 4900

Patent

active

056506163

ABSTRACT:
A surface analyzing apparatus includes a laser plasma radiation source, an optical condensing system for converging ultraviolet light, vacuum ultraviolet light, or X rays emitted from the laser plasma radiation source on the surface of a sample, and a mass spectrometer or a time-of-flight spectrometer for detecting the secondary ions emitted from the sample. Thus, the surface analyzing apparatus is capable of analyzing two-dimensionally adsorbed substances on the sample surface with a high resolving power.

REFERENCES:
patent: H1200 (1993-06-01), Neifeld
patent: 3798568 (1974-03-01), Willett
patent: 3953732 (1976-04-01), Oron et al.
patent: 4140905 (1979-02-01), Polanyi
patent: 4317994 (1982-03-01), Mallozzi et al.
patent: 4393311 (1983-07-01), Feldman et al.
patent: 4733073 (1988-03-01), Becker et al.
patent: 4780608 (1988-10-01), Cross et al.
patent: 4847493 (1989-07-01), Sodal et al.
patent: 5045694 (1991-09-01), Beavis et al.
patent: 5138158 (1992-08-01), Ninomiya et al.
patent: 5164592 (1992-11-01), Kitamori et al.
Shogo Nakamura, Physics of Surface, Kyoritsu Shuppan Kabushiki Kaisha, Dec. 1982, pp. 104-107.

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