Image analysis – Applications – Manufacturing or product inspection
Patent
1996-02-16
1997-12-09
Couso, Jose L.
Image analysis
Applications
Manufacturing or product inspection
382151, 382218, 348 86, 348 87, 348 94, 348 95, G06K 900
Patent
active
056968353
ABSTRACT:
A method is provided for aligning a silicon wafer (20) in a fabrication tool (37) having a stage (22) involving the steps of producing a digital image of a portion of wafer (20) in a scope-of-view window (48), converting the digital image to image primitives, comparing the image primitives to grammar template primitives to locate a known intersection on wafer (20); and moving the stage (22) to align wafer (20). A method and apparatus are disclosed for determining the misregistration of two layers of a wafer (20) by converting targets (158, 160) to primitives and determining the relative displacement in symbolic space. The misregistration apparatus involves a camera (34), a video-to-digital converter (32), a computer (28), and a stage adjuster (24).
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Cleavelin C. Rinn
Demoor Stephen J.
Hahn Kwang-Soo
Hennessey A. Kathleen
Lin YouLing
Brady III W. James
Couso Jose L.
Do Anh Hong
Donaldson Richard L.
Texas Instruments Incorporated
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