Apparatus and exposure mask having cylindrical bending...

Details Apparatus and exposure mask having cylindrical bending... Apparatus and exposure mask having cylindrical bending...

2006-09-26

2006-09-26

Schechter, Andrew (Department: 2871)

Liquid crystal cells, elements and systems

Nominal manufacturing methods or post manufacturing...

Sealing of liquid crystal

C349S187000

Reexamination Certificate

active

07113251

ABSTRACT:
In a backlight assembly, an assembled substrate on which a spacer including a light-curable material is formed is disposed on a base body and a light supply unit disposed on the base body provides a light to the assembled substrate so as to cure the spacer. An exposure mask formed with an opening is positioned at a path through which the light is supplied so as to selectively supply the light to the spacer of the assembled substrate.

REFERENCES:
patent: 4000407 (1976-12-01), Keller et al.
patent: 4873470 (1989-10-01), Myers
patent: 6863845 (2005-03-01), Saito et al.
patent: 2002/0167634 (2002-11-01), Watanabe et al.
patent: 2003/0156271 (2003-08-01), Byun et al.
patent: 2004/0001177 (2004-01-01), Byun et al.

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