Electric heating – Heating devices – Combined with container – enclosure – or support for material...
Reexamination Certificate
2007-08-28
2007-08-28
Robinson, Daniel (Department: 3742)
Electric heating
Heating devices
Combined with container, enclosure, or support for material...
C392S418000
Reexamination Certificate
active
11271537
ABSTRACT:
An adjusting technology of thermal processing is provided. A heating lamp and a reflector are disposed over a wafer and the heat flux distribution on the wafer generated by the individual heating lamp is measured and adjusted. A set of heating lamps formed by heating lamps is disposed over the wafer. The heating lamps are in concentric rings and arranged as an axi-symmetric array. The relative position between the set of heating lamps and the wafer is adjusted so that the wafer center is at the position with local mean heat flux from lamps between the most inner lamp subset and its adjacent lamp subset. Followed by adjusting the heating powers, either or both of the wafer and the set of heating lamps are rotated respect to the center of the wafer, so as to improve uniformity of the heat flux distribution on the heated object.
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Lai Yi-Hsiang
Lin Ming-June
Su Chiung-Chieh
Su Yong-Sen
Tsao Jen-Chieh
Chung Shan Institute of Science and Technology Armaments Bureau,
Robinson Daniel
Rosenberg , Klein & Lee
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