Apparatus and a method for high numerical aperture microscopic e

Details Apparatus and a method for high numerical aperture microscopic e Apparatus and a method for high numerical aperture microscopic e

1991-03-11

1993-05-04

McGraw, Vincent P.

Optics: measuring and testing

Inspection of flaws or impurities

Having predetermined light transmission regions

356239, 356301, 359350, 359356, 359368, G01N 2188, G02B 702, G02B 1314, G02B 2102

Patent

active

052086488

ABSTRACT:
Apparatus and a method for performing high resolution optical imaging in the near infrared of internal features of semiconductor wafers uses an optical device made from a material having a high index of refraction and held in very close proximity to the wafer. The optical device may either be a prism or a plano-convex lens. The plano-convex lens may be held in contact with the wafer or separated from the wafer via an air bearing or an optical coupling fluid to allow the sample to be navigated beneath the lens. The lens may be used in a number of optical instruments such as a bright field microscope, a Schlieren microscope, a dark field microscope, a Linnik interferometer, a Raman spectroscope and an absorption spectroscope.

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