Apparatus and a method for high numerical aperture microscopic e

Details Apparatus and a method for high numerical aperture microscopic e Apparatus and a method for high numerical aperture microscopic e

1992-09-30

1993-06-15

McGraw, Vincent P.

Optics: measuring and testing

By particle light scattering

With photocell detection

2503581, 2503601, 356301, 356349, 356360, 356432, G01B 902, G01N 2165, G01N 2135

Patent

active

052204030

ABSTRACT:
Apparatus and a method for performing high resolution optical imaging in the near infrared of internal features of semiconductor wafers uses an optical device made from a material having a high index of refraction and held in very close proximity to the wafer. The optical device may either be a prism or a plano-convex lens. The plano-convex lens may be held in contact with the wafer or separated from the wafer via an air bearing or an optical coupling fluid to allow the sample to be navigated beneath the lens. The lens may be used in a number of optical instruments such as a bright field microscope, a Schlieren microscope, a dark field microscope, a Linnik interferometer, a Raman spectroscope and an absorption spectroscope.

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