Abrading – Abrading process – With tool treating or forming
Patent
1998-01-20
2000-10-31
Banks, Derris H.
Abrading
Abrading process
With tool treating or forming
451444, 451443, B24B 100
Patent
active
061394041
ABSTRACT:
A semiconductor wafer polishing pad conditioner which includes a support structure and a roller which is rotatably mounted to the support structure. The roller has a working surface which is formed with a plurality of blades.
REFERENCES:
patent: 5081051 (1992-01-01), Mattingly et al.
patent: 5486131 (1996-01-01), Cesna et al.
patent: 5547417 (1996-08-01), Breivogel et al.
patent: 5611943 (1997-03-01), Cadien et al.
patent: 5645682 (1997-07-01), Skrovan
patent: 5651725 (1997-07-01), Kikuta et al.
patent: 5665656 (1997-09-01), Jairath
patent: 5674109 (1997-10-01), Kanzawa et al.
patent: 5709593 (1998-01-01), Guthrie et al.
patent: 5775983 (1998-07-01), Shendon et al.
patent: 5785585 (1998-07-01), Manfredi et al.
Banks Derris H.
Intel Corporation
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