Cleaning and liquid contact with solids – Apparatus – With means to movably mount or movably support the work or...
Patent
1997-04-10
1998-10-06
Stinson, Frankie L.
Cleaning and liquid contact with solids
Apparatus
With means to movably mount or movably support the work or...
134902, 134147, 134153, 211 4118, B08B 304
Patent
active
058162747
ABSTRACT:
Apparatus for cleaning semiconductor wafers comprises a tank for containing a liquid wherein the liquid has an upper surface. A wafer holder holds the semiconductor wafer in the tank with at least a portion of the semiconductor wafer being immersed in the liquid within the tank. A wafer-moving mechanism is constructed for engaging the semiconductor wafer in the tank to rotate the semiconductor wafer and to reciprocate the semiconductor wafer so that at least a central region of the wafer repeatedly passes through the surface of the liquid. The wafer-moving mechanism comprises first and second surfaces engageable with the semiconductor wafer and rotatable about respective first and second axes of rotation for rotating the wafer.
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Bartram Ronald D.
Hollander Eugene R.
MEMC Electronic Materials , Inc.
Stinson Frankie L.
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