Apodization measurement for lithographic apparatus

Details Apodization measurement for lithographic apparatus Apodization measurement for lithographic apparatus

2005-09-07

2008-10-28

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000

Reexamination Certificate

active

07443485

ABSTRACT:
A method and apparatus are provided for measuring the apodization of projection optics for use in a lithographic apparatus, the projection optics having an object plane where, in use, a reticle is placed, a pupil plane, and an image plane where, in use, a wafer is placed. The method includes placing one or more Appropriate apertures in said object plane for creating a substantially uniform light distribution, illuminating the or each aperture and measuring the intensity distribution at a plane which is conjugate to the pupil plane in order to calculate the apodization of the projection optics.

REFERENCES:
patent: 6710856 (2004-03-01), Van Der Laan et al.
patent: 7224430 (2007-05-01), Dierichs
patent: 7315353 (2008-01-01), Van De Kerkhof et al.
patent: 2002/0001088 (2002-01-01), Wegmann et al.

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