Aphron-containing well drilling and servicing fluids

Boring or penetrating the earth – Processes – Boring with specific fluid

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

507102, 507202, C09K 702

Patent

active

058818260

ABSTRACT:
The invention provides a method and fluid for drilling or servicing a well in a subterranean formation containing lost circulation zones or depleted, low pressure reservoirs. A method of decreasing the density of the fluid circulated in a borehole, decreasing the invasion of fluid into formations contacted by the fluid, or decreasing the lost circulation potential of the fluid is provided by using as the fluid an aqueous liquid having dispersed therein a polymer which increases the low shear rate viscosity of the fluid to the extent that the thixotropic index of the fluid is at least about 10 and a surfactant, and wherein the fluid contains aphrons preferably generated by the turbulence and pressure drop as the fluid exits the drill bit in the vicinity of the formation.

REFERENCES:
patent: 5513712 (1996-05-01), Sydansk
patent: 5682951 (1997-11-01), Sydansk
patent: 5716910 (1998-02-01), Totten et al.
patent: 5728652 (1998-03-01), Dobson, Jr. et al.
Felix Sebba, "Foams and Biliquid Foams-Aphrons", Virginia Polytechnic Institute and State University, pp. 62-69, 1987.
Gas Research Institute, "Underbalanced Drilling Manual", pp. 6-8, 75-81, 96, 101-104, 119-120, 125-127, 131, 135-139, 1997.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Aphron-containing well drilling and servicing fluids does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Aphron-containing well drilling and servicing fluids, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Aphron-containing well drilling and servicing fluids will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-809752

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.