Apertured window for enabling flexible illumination overfill...

Optical: systems and elements – Optical modulator – Light wave temporal modulation

Reexamination Certificate

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Details

C355S067000

Reexamination Certificate

active

08064122

ABSTRACT:
A dark border region may be integrated with a window covering a patterning device, such that light from an active area of the patterning device passes through the dark border region, while excess light is removed from the system by the dark border region. The dark border region may be, for example and without limitation, a light-absorbing material, a wedged light reflective coating that reflects light out of the lithography system, or an interference grating that causes destructive interference in unwanted light to remove the unwanted light from the system. The dark border region may overlap a similar dark border region located on the surface of on the patterning device to optimize a width of the total dark border region without sacrificing excessive valuable real-estate area on the surface of the patterning device or compromising alignment tolerance levels of the lithography system.

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English Language Abstract for JP 2004-046134 A, published Feb. 12, 2004; 1 page.
English Language Abstract for JP 2006-011065 A, published Jan. 12, 2006; 1 page.
English Language Abstract for JP 2006-113594 A, published Apr. 27, 2006; 1 page.
English Translation of Notification of Reason(s) for Refusal directed to related Japanese Patent application No. 2008-061039, mailed on Jan. 11, 2011, from the Japanese Patent Office; 2 pages.

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