Apertured nonplanar electrodes and forming methods

Electric lamp or space discharge component or device manufacturi – Process – Electrode making

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216 52, 216 56, H01J 902

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active

059349654

ABSTRACT:
Positional accuracy of apertures in nonplanar electrodes is improved with a new fabrication method. This method precedes process steps which establish a photoresist pattern that defines apertures with deformation steps which produce a nonplanar electrode. Thus, the deformation steps do not have an opportunity to spatially alter the photoresist pattern. The improved positional accuracy enhances the performance and lifetime of ion thrusters which include nonplanar electrodes that are fabricated with this process.

REFERENCES:
patent: 3325319 (1967-06-01), Frantzen
patent: 3947933 (1976-04-01), Banks et al.
patent: 4825646 (1989-05-01), Dorian et al.
patent: 5448883 (1995-09-01), Meserole, Jr. et al.

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