Apertured and unapertured reflector structures for electrolumine

Details Apertured and unapertured reflector structures for electrolumine Apertured and unapertured reflector structures for electrolumine

1979-08-08

1981-07-21

Davie, James W.

Oscillators

Molecular or particle resonant type

331 945C, 350164, 357 17, H01S 319

Patent

active

042801079

ABSTRACT:
A multilayered reflector structure deposited on the light emitting surface of a semiconductor electroluminescent device and consecutively comprising a layer of low refractive index material, a layer of intermediate refractive index material and a layer of high refractive index material. Ablative means remove and form an aperture in the outer high index layer at the region of optical radiation emission from said device whereby the level of reflectivity is highest at the center of the aperture as compared to structure regions adjacent to the aperture. In this manner, fundamental mode stabilization may be achieved. Also disclosed is a nonablated three layered reflector structure.

REFERENCES:
patent: 3843401 (1974-10-01), Carroll
patent: 3866238 (1975-02-01), Monroe
patent: 4001719 (1977-01-01), Krupka
patent: 4092659 (1978-05-01), Ettenberg
patent: 4100508 (1978-07-01), Wittke
patent: 4147409 (1979-04-01), Apfel

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