Aperture plate for lithography systems

Details Aperture plate for lithography systems Aperture plate for lithography systems

2006-03-14

2006-03-14

Sugarman, Scott J. (Department: 2873)

Optical: systems and elements

Lens

With light limiting or controlling means

C355S067000

Reexamination Certificate

active

07012763

ABSTRACT:
An aperture plate for lithography systems capable of improving NILS. The aperture plate includes a light-intercepting region and a light-transmitting region. The light-intercepting region has a reference center point. A horizontal reference line and a vertical reference line are defined on the light-intercepting region and intersect the reference center point. The light-transmitting region includes four pole apertures defining a central area. Two of the pole apertures are positioned on the horizontal reference line, and the other pole apertures are positioned on the vertical reference line. The light-transmitting region further includes at least a symmetric pattern aperture positioned in the central area, wherein the symmetric pattern aperture has a symmetric center overlapping the reference center point.

REFERENCES:
patent: 6842224 (2005-01-01), Mori

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