Etching a substrate: processes – Forming or treating mask used for its nonetching function
Patent
1994-06-14
1996-05-28
Powell, William
Etching a substrate: processes
Forming or treating mask used for its nonetching function
1566301, 1566441, 216 2, 216 56, 428131, 430 5, 437225, B44C 122, C25F 300
Patent
active
055202977
ABSTRACT:
A semiconductor substrate has a plurality of chip portions and chip separating portions for partitioning the plurality of chip portions into each other. The plurality of chip portions and the separating portions are etched on one side of the semiconductor substrate so that each of the plurality of chip portions is provided with stencil patterns. Furthermore, the plurality of chip portions and chip separating portions are etched on the other side of the semiconductor substrate so that the stencil patterns are exposed and the plurality of chip portions are capable of being substantially separated from each other.
REFERENCES:
patent: 4021276 (1977-05-01), Cho et al.
patent: 4417946 (1983-11-01), Bohlen et al.
patent: 4589952 (1986-05-01), Behringer et al.
Kagami Teruyuki
Katane Niro
Nakayama Yoshinori
Satoh Hidetoshi
Tanabe Mitsuo
Hitachi , Ltd.
Powell William
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