Aperture pattern-printing plate for shadow mask and method for m

Details Aperture pattern-printing plate for shadow mask and method for m Aperture pattern-printing plate for shadow mask and method for m

1990-10-11

1992-07-28

Hess, Bruce H.

Stock material or miscellaneous articles

Structurally defined web or sheet

Discontinuous or differential coating, impregnation or bond

427 96, 428336, 428447, 428901, 430 5, 430311, G03F 900, B05D 512

Patent

active

051340151

ABSTRACT:
An aperture pattern-printing plate used for manufacturing a shadow mask, which comprises a transparent substrate, and an emulsion layer which is formed on the transparent substrate and which is opaque at portions corresponding to apertures of the shadow mask and transparent at other portions, wherein the emulsion layer is overlaid with at least one of the following a substantially-amorphous, transparent scratch-preventing film obtained by hydrolysis and condensation of metal alcoholate and having a thickness of not more than 1.5 .mu.m, and a foreign matter-preventing film formed substantially of silicone and having a thickness of not more than 0.5 .mu.m. The foreign matter-preventing film is formed on the scratch-preventing film if the foreign matter-preventing film and scratch-preventing film are both formed.

REFERENCES:
patent: 3897251 (1975-07-01), Detrich et al.
patent: 4176605 (1979-12-01), Yoshida et al.
patent: 4588676 (1986-05-01), Moscony et al.
patent: 4656107 (1987-04-01), Moscony et al.
patent: 4669871 (1987-06-01), Wetzel et al.
patent: 4735890 (1988-04-01), Nakane

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