Aperture formation in aluminum circuit card for enhanced thermal

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – With provision for cooling the housing or its contents

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257707, 257679, 257723, H01L 2334, H01L 2336

Patent

active

051986930

ABSTRACT:
A method and system are provided for forming apertures in the dielectric layers of an aluminum circuit to allow electrical connection to the aluminum core and enhance the thermal efficiency of integrated circuit devices attached thereto. Specifically, the apertures are formed to accommodate the ICs and allow them to be in direct contact with the aluminum core layer of the circuit card. The apertures are formed by placing a photoresist material on the aluminum core in locations corresponding to the desired locations of the aperture. The photoresist material is used as a "placeholder" during subsequent processing. The aluminum is then anodized to form aluminum oxide and a polymer material is then electrophoretically placed over the aluminum oxide. The photoresist "placeholder" is then removed, leaving an aperture that will accommodate an IC. The top of the polymer layer can then be circuitized to interconnect the chips.

REFERENCES:
patent: 4261792 (1981-04-01), Tsuji et al.
patent: 4564584 (1986-01-01), Fredericks et al.
patent: 4589961 (1986-05-01), Gershenson
patent: 4774633 (1988-09-01), Dehaine et al.
patent: 4894126 (1990-01-01), Mahmoud
patent: 4898651 (1990-02-01), Mahmoud
patent: 4962415 (1990-10-01), Yamamoto et al.
patent: 5099309 (1992-03-01), Kryzaniwsky
IBM TDB "Sealing Technique for Porous Anodic Al.sub.2 O.sub.3 Fimls", vol. 14, No. 10, Mar. 1972, p. 2898.
IBM TDB "Anodization Process for Planarization of Aluminum-Copper-Silicon Metallurgy", vol. 16, No. 3, Aug. 1973, p. 1010.
IBM TDB "Process for Noble Metal Pattern Generation", vol. 16, No. 7, Dec. 1973, p. 2157.
IBM TDB "Monolithic Studs for Interlevel Connectors", vol. 17, No. 6, Nov. 1974, pp. 1605-1606.
IBM TDB "Aluminum-Aluminum Oxide Gas Panel", vol. 26, No. 6, Nov. 1983, p. 2798.
Research Disclosure "Screened Polymer Thick Film Resistors and Metallization on Thick Anodic Coatings", Sep. 1985, p. 257.
IBM TDB "Sealing Cracks in Anodized Aluminum with Electrodeposited Organic Material for Dielectric Protection", vol. 32, No. 12, May 1990, p. 148.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Aperture formation in aluminum circuit card for enhanced thermal does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Aperture formation in aluminum circuit card for enhanced thermal, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Aperture formation in aluminum circuit card for enhanced thermal will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1283136

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.