Antistatic silver halide photographic light-sensitive material

Details Antistatic silver halide photographic light-sensitive material Antistatic silver halide photographic light-sensitive material

1989-01-17

1990-02-06

Le, Hoa Yan

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Antihalation or filter layer containing

430514, 430523, 430527, 430528, 430531, 430627, 430630, 430631, 430930, 430961, 528391, 528397, 528398, 546186, 546191, G03C 182, C08G 7500, C07D21100

Patent

active

048988081

ABSTRACT:
An antistatic silver halide photographic light-sensitive material having a support, provided thereon, at least one light-sensitive layer and at least one non-light-sensitive layer is disclosed. Said at least one non-light-sensitive layer comprises a polymer compound consisting essentially of a repeated structural unit represented by Formula [I], and a formamide compound represented by Formula [II]; ##STR1## wherein Z, and Z.sub.2 represent the group of the atoms necessary to form a six-membered ring with--N.sup..sym. --; R represents a divalent group; R.sub.1 and R.sub.2 represent independently one selected from the group consisting of an alkyl group and an aryl group; R.sub.3 represents a hydrocarbon group; R.sub.5 and R.sub.6 represent independently a hydrogen atom or an alkyl group; X.sub.1.sup..crclbar. and X.sub.2.sup..crclbar. represent an anion; a and l represent an integer of 0 and 1.

REFERENCES:
patent: 3988158 (1976-10-01), Muramatsu et al.
patent: 4126467 (1978-11-01), Miyazako et al.

Affiliated with

Also associated with

Rating

Antistatic silver halide photographic light-sensitive material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Antistatic silver halide photographic light-sensitive material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Antistatic silver halide photographic light-sensitive material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-441518