Antistatic photographic multi-layer base having a hydrophilic an

Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing

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430529, 430531, 430536, 430537, 428413, 428447, 428532, G03C 194

Patent

active

045827826

ABSTRACT:
A photographic base is protected against the adverse effects resulting from the accumulation of static electrical charges by providing it with a first antistatic hydrophilic layer and a second protective hydrophobic layer coated onto said first layer, said first layer having been formed by coating onto said base a liquid coating composition comprising a hydrophilic non-diffusing sulfonated polymer in the presence of an epoxy-silane compound. The antistatic base is particularly useful for photographic elements comprising at least one photosensitive image-forming layer, on one side thereof, and the first antistatic layer and the second protective layer on the opposite side thereof. The antistatic layer is durable, abrasion-resistant, non-tacky and can withstand the aqueous photographic processings without adverse effects.

REFERENCES:
patent: 3525621 (1970-08-01), Miller
patent: 3786902 (1974-01-01), van Paesschen et al.
patent: 3856530 (1974-12-01), van Paesschen et al.
patent: 4004327 (1977-01-01), van Paesschen et al.

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