Antistatic photographic base and light-sensitive element

Details Antistatic photographic base and light-sensitive element Antistatic photographic base and light-sensitive element

1988-12-01

1990-04-03

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430527, 430531, 430536, 430961, 428452, 428508, 428536, G03C 182

Patent

active

049140183

ABSTRACT:
An improved antistatic base comprises a polymeric support film having coated thereon in sequence a first antistatic layer comprising a quaternary polyelectrolyte compound and a polymeric hydrophobic binder and a second protective layer comprising a polymeric hydrophobic binder, wherein said quaternary polyelectrolyte compound is a homopolymer or a copolymer of a diallyldialkylammonium salt compound.
The antistatic base is particularly useful as a support for light-sensitive silver halide photographic elements.

REFERENCES:
patent: 3607286 (1971-09-01), Wood
patent: 4070189 (1978-01-01), Kelley et al.
patent: 4225665 (1980-09-01), Schadt, III
patent: 4267266 (1981-05-01), Shibue et al.
patent: 4585730 (1986-04-01), Cho

Affiliated with

Also associated with

Rating

Antistatic photographic base and light-sensitive element does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Antistatic photographic base and light-sensitive element, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Antistatic photographic base and light-sensitive element will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1357196