Antistatic layer for silver halide photographic materials

Details Antistatic layer for silver halide photographic materials Antistatic layer for silver halide photographic materials

1979-08-27

1981-05-05

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430529, 430631, G03C 178, G03C 196

Patent

active

042660165

ABSTRACT:
Silver halide photographic materials having excellent antistatic property and high acceptability for drafting, processing resistance and adhesion to hydrophobic supports can be obtained by providing antistatic layer which comprises (a) a styrene-maleic anhydride copolymer, (b) colloidal silica and (c) at least one compound selected from the group consisting of compounds having at least 2 ethyleneimino groups and compounds having at least 2 epoxy rings and which has a pH value of at least about 5, said antistatic layer being provided on one or both surfaces of the support.

REFERENCES:
patent: 3072484 (1963-01-01), Unruh et al.
patent: 3090704 (1963-05-01), Collins et al.
patent: 3220848 (1965-11-01), Himmelmann et al.
patent: 3895950 (1975-07-01), Geiger et al.
patent: 4008087 (1977-02-01), Aono et al.
patent: 4166050 (1979-08-01), Miyazako et al.

Affiliated with

Also associated with

Rating

Antistatic layer for silver halide photographic materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Antistatic layer for silver halide photographic materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Antistatic layer for silver halide photographic materials will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-296539