Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Structurally defined
Patent
1999-06-21
2000-07-04
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Structurally defined
430527, 430528, 430530, 430946, 359463, 359620, G03C 185, G03C 189, G03C 1765, G03C 714
Patent
active
060836741
ABSTRACT:
The invention relates to a lenticular support comprising a polymer sheet having a lower lenticular surface, wherein said lower lenticular surface has a uniform coating of an antistat comprising clay or metal containing particles.
REFERENCES:
patent: 3751258 (1973-08-01), Howe et al.
patent: 4070189 (1978-01-01), Kelley et al.
patent: 4173480 (1979-11-01), Woodward
patent: 5013621 (1991-05-01), Kistner
patent: 5279912 (1994-01-01), Telfer et al.
patent: 5326688 (1994-07-01), Stimson et al.
patent: 5368995 (1994-11-01), Christian et al.
patent: 5424553 (1995-06-01), Morton
patent: 5539487 (1996-07-01), Taguchi et al.
patent: 5633719 (1997-05-01), Oehlbeck et al.
patent: 5639580 (1997-06-01), Morton
patent: 5689372 (1997-11-01), Morton
patent: 5699190 (1997-12-01), Young et al.
patent: 5729332 (1998-03-01), Fogel et al.
patent: 5822038 (1998-10-01), Slater et al.
patent: 5869227 (1999-02-01), Majumdat et al.
patent: 5891611 (1999-04-01), Majumdat et al.
Hennessey William J.
Majumdar Debasis
Melpolder Sharon M.
Eastman Kodak Company
Leipold Paul A.
Schilling Richard L.
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