Antistatic film and method of manufacturing the same

Details Antistatic film and method of manufacturing the same Antistatic film and method of manufacturing the same

1993-08-20

1995-09-12

Nakarani, D. S.

Stock material or miscellaneous articles

Web or sheet containing structurally defined element or...

Physical dimension specified

427399, 427402, 428245, 428288, 428289, 428429, 428450, 428451, 428452, 428688, 428922, B32B 704

Patent

active

054495547

ABSTRACT:
In a molecule of a monomolecular film, a metal complex is introduced to form an antistatic film. This film is desirably transparent, durable, extremely thin and weakly conductive.
The method of manufacturing an antistatic film involves (i) exposing a substrate with an active hydrogen atom thereon to a chemical adsorbent containing a straight carbon-chain group with a silyl group at one end and a phosphonate or carboxyl group at the other end to form a chemically adsorbed monomolecular film, and (ii) soaking the monomolecular film in a solution of a metal salt to form a film containing a complex of the metal element. An antistatic multi-monomolecular film can also be formed by laminating the monomolecular films using hydroxyl groups each bonding to the metal element in each monomolecular film.

REFERENCES:
patent: 4283476 (1981-08-01), Farnsworth et al.
patent: 4539061 (1985-09-01), Sagiv
patent: 5091468 (1992-02-01), Takeuchi
European Search Report (Application No. EP93113927), Dec. 17, 1993.

Affiliated with

Also associated with

Rating

Antistatic film and method of manufacturing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Antistatic film and method of manufacturing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Antistatic film and method of manufacturing the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-404471