Antistatic and electrically conductive relief images, processes

Radiation imagery chemistry: process – composition – or product th – Imaged product – Deposited metal coating on image

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430270, 430900, G03C 300

Patent

active

050771566

ABSTRACT:
Substrates which have been coated with a mixture of a radiation-sensitive organic material, an unsubstituted or substituted tetrathio-, tetraseleno- or tetratelluro-naththalene and/or -tetracene and a substance containing active Cl, Br and/or I atoms, form radiation-sensitive layers with electrically conductive charge transfer complexes under the action of thermal energy. Irradiation under an image mask and subsequent development give antistatic or electrically conductive relief images which can be used, for example, as electrodes or conductive connections for electronic components.

REFERENCES:
patent: 3403165 (1968-09-01), Matsunaga
patent: 3636048 (1972-01-01), Klingsberg
patent: 4106934 (1978-08-01), Turnblom
patent: 4152152 (1979-05-01), Contois et al.
patent: 4384025 (1983-05-01), Hilti et al.
patent: 4522754 (1985-06-01), Hilti et al.
patent: 4601853 (1986-07-01), Hilti et al.
patent: 4604340 (1986-08-01), Grossa
patent: 4617151 (1986-10-01), Mayer et al.
patent: 4801701 (1989-01-01), Hilti et al.
Pure and Applied Chemistry, 56(3), 355-368 (1984).
Organometallics, 3, 732-735 (1984).

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