Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Reexamination Certificate
2008-05-06
2008-05-06
Fletcher, III, William Phillip (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
C427S534000, C427S553000, C378S154000, C378S149000, C378S147000
Reexamination Certificate
active
07368151
ABSTRACT:
An antiscattering grid for an X-ray imaging apparatus of the type comprising a substrate having a plurality of metallized partitions that together define a plurality of cells distributed over the substrate. The partitions allow passage of the X-rays emitted from a source lying in line with the grid, and absorbing the X-rays not coming directly from this source. The substrate is made of a polymer material that may be formed by radiation curing of a monomer sensitive to this radiation. The substrate may be substantially planar and the partitions may be oriented to form a focused grid.
REFERENCES:
patent: 5008160 (1991-04-01), Jenkin
patent: 5307394 (1994-04-01), Sokolov
patent: 5389473 (1995-02-01), Sokolov
patent: 5418833 (1995-05-01), Logan
patent: 5581592 (1996-12-01), Zarnoch et al.
patent: 5606589 (1997-02-01), Pellegrino et al.
patent: 5814235 (1998-09-01), Pellegrino et al.
patent: 5970118 (1999-10-01), Sokolov
patent: 6075840 (2000-06-01), Pellegrino et al.
patent: 6175615 (2001-01-01), Guru et al.
patent: 6309581 (2001-10-01), Gervasi
patent: 6459771 (2002-10-01), Mancini
patent: 0681736 (1994-08-01), None
patent: 0967619 (1999-12-01), None
patent: 2221470 (1990-02-01), None
patent: 9417533 (1994-08-01), None
Patent Abstracts of Japan, vol. 2000, No. 14, Mar. 5, 2000; JP 2000 319430 Nov. 21, 2000.
Patent Abstracts of Japan, vol. 008, No. 258, Nov. 27, 1984; JP 59-131430 Jul. 28, 1984.
Patent Abstracts of Japan, vol. 009, No. 097, Apr. 26, 1985; JP 59-223403 Dec. 15, 1984.
European Search Report; Application No. EP 02257225.9; Date of filling Oct. 17, 2002; Date of Publication Apr. 23, 2003.
Bacher Guillaume
Klausz Remy
Richou Bruno Gilles
Souchay Henri
Cantor & Colburn LLP
Fletcher, III William Phillip
GE Medical Systems Global Technology Company LLC
Sellman Cachet I.
LandOfFree
Antiscattering grid and a method of manufacturing such a grid does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Antiscattering grid and a method of manufacturing such a grid, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Antiscattering grid and a method of manufacturing such a grid will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2768477