Antireflective polyimide dielectric for photolithography

Details Antireflective polyimide dielectric for photolithography Antireflective polyimide dielectric for photolithography

1994-09-30

1995-08-15

Ryan, Patrick J.

Stock material or miscellaneous articles

Structurally defined web or sheet

Discontinuous or differential coating, impregnation or bond

428461, 4284735, 430909, 430313, 430270, B32B 900

Patent

active

054417970

ABSTRACT:
A process is disclosed for making circuit elements by photolithography comprising depositing an antireflective polyimide or polyimide precursor layer on a substrate and heating the substrate at 200.degree. C. to 500.degree. C. to provide a functional integrated circuit element that includes an antireflective polyimide layer. The antireflective polyimide layer contains a sufficient concentration of at least one chromophore to give rise to an absorbance sufficient to attenuate actinic radiation at 405 or 436 nm. Preferred chromophores include those arising from perylenes, naphthalenes and anthraquinones. The chromophore may reside in a dye which is a component of the polyimide coating mixture or it may reside in a residue which is incorporated into the polyimide itself.

REFERENCES:
patent: 4126466 (1978-11-01), Roos
patent: 4189735 (1980-02-01), Bell et al.
patent: 4248957 (1981-02-01), Sander
patent: 4268601 (1981-05-01), Namiki et al.
patent: 4307172 (1981-12-01), Ishihara et al.
patent: 4465767 (1984-08-01), Oba et al.
patent: 4480009 (1984-10-01), Berger
patent: 4668606 (1987-05-01), DoMinh et al.
patent: 4745044 (1988-05-01), Gregor
patent: 4766055 (1988-08-01), Kawabata
patent: 4910122 (1990-03-01), Arnold et al.
patent: 5028503 (1991-07-01), Chang
patent: 5326669 (1994-07-01), Curtis
patent: 5331182 (1994-07-01), Takimoto

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