Antireflective hardmask composition and methods for using same

Details Antireflective hardmask composition and methods for using same Antireflective hardmask composition and methods for using same

2006-02-06

2010-11-09

Hamilton, Cynthia (Department: 1795)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

C430S271100, C525S482000, C525S486000, C525S491000, C525S494000

Reexamination Certificate

active

07829638

ABSTRACT:
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided.

REFERENCES:
patent: 5132349 (1992-07-01), Iimuro et al.
patent: 5420233 (1995-05-01), Isogai et al.
patent: 5886102 (1999-03-01), Sinta et al.
patent: 5939236 (1999-08-01), Pavelchek et al.
patent: 7378217 (2008-05-01), Oh et al.
patent: 7405029 (2008-07-01), Oh et al.
patent: 7514199 (2009-04-01), Uh et al.
patent: 2004/0110084 (2004-06-01), Inomata et al.
patent: 2006/0269867 (2006-11-01), Uh et al.
patent: 2007/0003863 (2007-01-01), Uh et al.
patent: 2007/0059635 (2007-03-01), Oh et al.
patent: 2007/0072111 (2007-03-01), Oh et al.
patent: 2007/0154658 (2007-07-01), Kang et al.
patent: 1204547 (1986-05-01), None
patent: 0 491 045 (1992-01-01), None
patent: 2 003 896 (1979-03-01), None
patent: 06-136122 (1994-05-01), None
patent: 9-146100 (1997-06-01), None
patent: 11-084391 (1999-03-01), None
RN 26834-20-6, REgistry, ACS on STN, etnered Nov. 16, 1984, two pages.

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