Antireflective hard mask compositions

Details Antireflective hard mask compositions Antireflective hard mask compositions

2006-08-29

2009-10-20

Hoang, Quoc D (Department: 2892)

Active solid-state devices (e.g., transistors, solid-state diode

Responsive to non-electrical signal

Electromagnetic or particle radiation

C438S636000, C430S270100, C257SE21029, C257SE51046

Reexamination Certificate

active

07605439

ABSTRACT:
The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.

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