Antireflective hard mask compositions

Details Antireflective hard mask compositions Antireflective hard mask compositions

2005-05-10

2005-05-10

Kornakov, M. (Department: 1746)

Etching a substrate: processes

Forming or treating electrical conductor article

Forming or treating resistive material

C430S327000, C430S270100, C430S271100, C430S272100, C430S273100, C430S014000, C430S018000

Reexamination Certificate

active

06890448

ABSTRACT:
New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.

REFERENCES:
patent: 4981530 (1991-01-01), Clodgo et al.
patent: 5100503 (1992-03-01), Allman et al.
patent: 5234990 (1993-08-01), Flaim et al.
patent: 5346586 (1994-09-01), Keller
patent: 5380621 (1995-01-01), Dichiara et al.
patent: 5380889 (1995-01-01), Hanawa et al.
patent: 5422223 (1995-06-01), Sachdev et al.
patent: 5468342 (1995-11-01), Nulty et al.
patent: 5545588 (1996-08-01), Yoo
patent: 5744227 (1998-04-01), Bright et al.
patent: 5747388 (1998-05-01), Kusters et al.
patent: 5747622 (1998-05-01), Maeda et al.
patent: 5750316 (1998-05-01), Kawamura et al.
patent: 5750442 (1998-05-01), Juengling
patent: 5753417 (1998-05-01), Ulrich
patent: 5821169 (1998-10-01), Nguyen et al.
patent: 5851730 (1998-12-01), Thackeray et al.
patent: 5851738 (1998-12-01), Thackeray et al.
patent: 5886102 (1999-03-01), Sinta et al.
patent: 5935760 (1999-08-01), Shao et al.
patent: 5939236 (1999-08-01), Pavelchek et al.
patent: 5939511 (1999-08-01), Zampini et al.
patent: 5981145 (1999-11-01), Ding et al.
patent: 6165697 (2000-12-01), Thackeray et al.
patent: 6261743 (2001-07-01), Pavelchek et al.
patent: 6270948 (2001-08-01), Sato et al.
patent: 6316165 (2001-11-01), Pavelchek et al.
patent: 6329118 (2001-12-01), Hussein et al.
patent: 6368400 (2002-04-01), Baldwin et al.
patent: 6368768 (2002-04-01), Jung et al.
patent: 6410209 (2002-06-01), Adams et al.
patent: 6416825 (2002-07-01), Kobayashi et al.
patent: 6451503 (2002-09-01), Thackeray et al.
patent: 6472128 (2002-10-01), Thackeray et al.
patent: 6528235 (2003-03-01), Thackeray et al.
patent: 6773864 (2004-08-01), Thackeray et al.
patent: 20020031729 (2002-03-01), Trefonas et al.
patent: 20020055000 (2002-05-01), Kennedy et al.
patent: 0 494 744 (1992-07-01), None
patent: 0501178 (1992-09-01), None
patent: 0 803 776 (1997-10-01), None
patent: 0 823 661 (1998-02-01), None
patent: 406244286 (1994-09-01), None
patent: WO 0077575 (2000-12-01), None
A. Grill. Plasma in Materials Fabrication. 1994, IEEE Press Mark, p. 224, 5-th paragraph.

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