Coating processes – With post-treatment of coating or coating material – Heating or drying
Reexamination Certificate
2007-12-04
2007-12-04
Zimmer, Marc S. (Department: 1712)
Coating processes
With post-treatment of coating or coating material
Heating or drying
C106S287120, C106S287130, C106S287160, C528S021000, C528S043000
Reexamination Certificate
active
10859531
ABSTRACT:
It is an object of the present invention to provide a material for an antireflective film that has high etching selectivity with respect to the resist, that is, that has a faster etching speed than the resist, a pattern formation method for forming an antireflective film layer on a substrate using this antireflective film material, and a pattern formation method using this antireflective film as a hard mask for substrate processing. The present invention provides a silicone resin for preventing reflection comprising an organic group comprising a carbon-oxygen single bond and/or a carbon-oxygen double bond; a light-absorbing group; and a silicon atom whose terminal end or ends are Si—OH and/or Si—OR. It also provides an antireflective film material comprising this silicone resin (A) for preventing reflection film, an organic solvent (B) and an acid generator (C).
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Asano Takeshi
Iwabuchi Motoaki
Ogihara Tsutomu
Yagihashi Fujio
Myers Bigel Sibley & Sajovec P.A.
Shin-Etsu Chemical Co. , Ltd.
Zimmer Marc S.
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