Antireflective coatings for photoresist compositions

Details Antireflective coatings for photoresist compositions Antireflective coatings for photoresist compositions

1996-08-16

1997-07-29

Yoon, Tae

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

526287, 526288, 430 97, 430423, 430435, 5253272, 525376, 524555, C08F22600, C08F 830, G03G 1306

Patent

active

056523173

ABSTRACT:
The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.

REFERENCES:
patent: 4631328 (1986-12-01), Ringsdorf et al.
patent: 5496899 (1996-03-01), Fell et al.

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