Antireflective coating, coating composition, and...

Stock material or miscellaneous articles – Composite – Of silicon containing

Reexamination Certificate

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C528S034000, C528S035000, C528S036000, C106S287130

Reexamination Certificate

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11244154

ABSTRACT:
An antireflective coating having improved alkali resistance is formed on a transparent substrate of synthetic resin as an outermost layer and has a three-dimensional crosslinked structure containing F and Si atoms. The crosslinked structure is composed of Si—O—Si and Si—C2H4—(CF2)n—C2H4—Si linkages wherein n is 4 or 6; the molar ratio of F atoms to Si atoms is from 8.0 to 10.0; and perfluoroalkyl groups account for 90 to 100 mol % of all monovalent organic substituent groups attached to silicon atoms. The antireflective coating can exhibit such alkali resistance that when a droplet of a 1 wt % NaOH aqueous solution is rested on the antireflective coating for 30 minutes and then wiped off, the appearance of the coating is kept unchanged from the initial appearance.

REFERENCES:
patent: 5314731 (1994-05-01), Yoneda et al.
patent: 5464704 (1995-11-01), Yoneda et al.
patent: 5645939 (1997-07-01), Yoneda et al.
patent: 2004/0209084 (2004-10-01), Yamaya et al.
patent: 61-40845 (1986-02-01), None
patent: 6-29332 (1994-04-01), None
patent: 2629813 (1997-04-01), None
patent: 3210045 (2001-07-01), None
patent: 2002-53805 (2002-02-01), None
patent: 2004-315712 (2004-11-01), None

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