Antireflection film and exposure apparatus using the same

Details Antireflection film and exposure apparatus using the same Antireflection film and exposure apparatus using the same

1995-02-03

1997-08-26

Dzierzynski, Paul M.

Optical: systems and elements

Having significant infrared or ultraviolet property

Multilayer filter or multilayer reflector

359361, 359586, 359588, 359589, F21V 904, G02B 508, G02B 110, G02B 528

Patent

active

056615965

ABSTRACT:
This specification discloses antireflection film and an exposure apparatus using the same. The exposure apparatus has an optical system, and antireflection film formed on the refracting surface of the optical system, the antireflection film having a high refractive index layer having Al.sub.2 O.sub.3 or Ta.sub.2 O.sub.5 and a low refractive index layer having SiO.sub.2.

REFERENCES:
patent: 4196246 (1980-04-01), Takayama et al.
patent: 4805989 (1989-02-01), Nakajima
patent: 5381210 (1995-01-01), Hagiwara
patent: 5408489 (1995-04-01), Kugler et al.
patent: 5457570 (1995-10-01), Lu et al.

Affiliated with

Also associated with

Rating

Antireflection film and exposure apparatus using the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Antireflection film and exposure apparatus using the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Antireflection film and exposure apparatus using the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1992142