Antireflection film

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350166, G02B 528

Patent

active

047384972

ABSTRACT:
An antireflection film composed of a layer of arsenic triselenide having an optical thickness in the range between 2.518 and 2.783 .mu.m, a layer of potassium chloride having an optical thickness in the range between 1.151 and 1.272 .mu.m and a layer of arsenic triselenide having an optical thickness in the range between 0.577 and 0.749 .mu.m which are successively formed on a member of infrared radiation transmitting material formed of a mixture of thalium iodide and thalium bromide. The member provided with the three-layer antireflection film is used in an atmosphere of protective gas, such as dry air or dry N.sub.2 gas.

REFERENCES:
Optical Engineering, vol. 18, No. 6, Nov./Dec. 1979, pp. 586-590, Bellingham, U.S.; W. T. Boord et al.; "Low Absorption TlI/KCl/TlI Antireflection Coatings for KCl Surfaces", Abstract.
J.E.E. Journal of Electronic Engineering, vol. 21, No. 212, Aug. 1984, pp. 30-34, Tokyo, JP; H. Ishiwatari: "Developing a CO.sub.2 Laser for Precise Surgical Applications".

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