Antifuse with electrostatic assist

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics

Reexamination Certificate

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Details

C257S050000, C257S528000, C257S529000, C438S131000, C438S467000, C438S600000, C438S660000

Reexamination Certificate

active

06844609

ABSTRACT:
A structure and method for providing an antifuse which is closed by laser energy with an electrostatic assist. Two or more metal segments are formed over a semiconductor structure with an air gap or a porous dielectric between the metal segments. Pulsed laser energy is applied to one or more of the metal segments while a voltage potential is applied between the metal segments to create an electrostatic field. The pulsed laser energy softens the metal segment, and the electrostatic field causes the metal segments to move into contact with each other. The electrostatic field reduces the amount of laser energy which must be applied to the semiconductor structure to close the antifuse.

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patent: 5915171 (1999-06-01), Sheu
patent: 5936297 (1999-08-01), Jun
patent: 6288437 (2001-09-01), Forbes et al.

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