Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing
Patent
1978-03-24
1980-02-26
Schilling, Richard C.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified backing or protective layer containing
430961, G03C 178, G03C 196, G03C 176, G03C 300
Patent
active
041904494
ABSTRACT:
A photographic light-sensitive material comprising a support having thereon at least one silver halide emulsion layer and an outermost layer thereof containing gelatin and colloidal silica prepared by adding potassium hydroxide to an aqueous dispersion of colloidal silica and a method of improving the antiadhesive property of a photographic light-sensitive material which comprises incorporating colloidal silica prepared by adding potassium hydroxide to an aqueous dispersion of colloidal silica into an outermost layer containing gelatin of a photographic light-sensitive material.
REFERENCES:
patent: 3053662 (1962-09-01), Mackey et al.
patent: 3591379 (1971-07-01), Plakunov
patent: 4021245 (1977-03-01), Nagatomo et al.
Horie Ikutaro
Naoi Takashi
Fuji Photo Film Co. , Ltd.
Schilling Richard C.
LandOfFree
Antiadhesive photographic materials and method of improving anti does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Antiadhesive photographic materials and method of improving anti, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Antiadhesive photographic materials and method of improving anti will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2111816