Anti-sludging compounds in photographic material

Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430488, 430961, 430929, G03C 176

Patent

active

051870541

ABSTRACT:
A photographic material is disclosed containing in a non-light sensitive layer above the emulsion layer an anti-sludging compound corresponding to following general formula (I): ##STR1## wherein Ball represents a ballast group, L represents a divalent linking group and Z represents the necessary atoms to close a heterocyclic ring with the proviso that said heterocyclic ring contains no mercapto substituent. The divalent linking group is preferably chosen from the list of --O--, --S--, --CO--NR.sub.1 --, --NR.sub.2 --NR.sub.3 --,--SO.sub.2 --NR.sub.4 --, --O--CR.sub.5 R.sub.6 --CO--NH-- wherein each of R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, and R.sub.6 represents hydrogen, alkyl or aralkyl. The heterocyclic ring is preferably chosen from the list of imidazole, benzimidazole, 1,2,3-triazole, 1,2,4-triazole, benzotriazole, tetrazole, indazole, uracil and hydantoin.
The non-light sensitive layer, wherein the anti-sludging compound is added, is preferably the top protective layer.

REFERENCES:
patent: 3438777 (1969-04-01), Willems et al.
patent: 3769015 (1973-10-01), Itoh et al.
patent: 3976875 (1966-10-01), Schwalenstocker

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Anti-sludging compounds in photographic material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Anti-sludging compounds in photographic material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Anti-sludging compounds in photographic material will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2147617

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.