Anti-reflective structures

Optical: systems and elements – Diffraction – From grating

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C216S024000, C430S005000

Reexamination Certificate

active

07145721

ABSTRACT:
An anti-reflective structure is formed on a surface to transmit incident light with minimal losses. The anti-reflective surface has a plurality of protrusions having a feature size smaller than the wavelength of incident light. The protrusions increase in height in either a sloped linear manner or in a curvilinear manner, and the protrusions repeat across the surface in at least one dimension to transmit the incident light. Gray scale lithography may be used to produce these patterns of protrusions in photoresist layers. High fidelity transfer of the protrusion patterns into the surfaces is accomplished by utilizing, for example, an electron cyclotron resonance plasma. Transmission values at such patterned surfaces maybe as high as 99.3%.

REFERENCES:
patent: 4013465 (1977-03-01), Clapham et al.
patent: 4456501 (1984-06-01), Bayman et al.
patent: 4729815 (1988-03-01), Leung
patent: 5007708 (1991-04-01), Gaylord et al.
patent: 5120605 (1992-06-01), Zuel et al.
patent: 5373182 (1994-12-01), Norton
patent: 5482800 (1996-01-01), Gal
patent: 5483387 (1996-01-01), Bauhahn et al.
patent: 5561558 (1996-10-01), Shiono et al.
patent: 5694247 (1997-12-01), Ophey et al.
patent: 5701008 (1997-12-01), Ray et al.
patent: 5808350 (1998-09-01), Jack et al.
patent: 5822091 (1998-10-01), Baker
patent: 6107000 (2000-08-01), Lee et al.
patent: 6144083 (2000-11-01), Yin
patent: 6359735 (2002-03-01), Gombert et al.
patent: 6410213 (2002-06-01), Raguin et al.
patent: 6914724 (2005-07-01), Redmond
patent: 3831503 (1990-03-01), None
patent: 0797255 (1997-09-01), None
patent: WO 98/39673 (1988-09-01), None
Motamedi, M.E. et al., “Antireflection surfaces in silicon using binary optics technology”, Applied Optics, vol. 31, No. 22 (Aug. 1, 1992), pp. 4371-4376.
Gaylord, et al., “Zero-reflectivity high spatial-frequency rectangular-groove dielectric surface-relief gratings”, Applied Optics, OSA, Optical Society of America, Washington, DC, vol. 25, No. 24, Dec. 15, 1986 pp. 4562-4567.
Pearton, et al., “Plasma Etching of ZnS, ZnSe, CdS, and CdTe in Electron Cyclotron Resonance Ch4/H2/Ar and H2/Ar Discharges”, Journal of Vacuum Science and Technology: Part B, AVS/AIP Melville, New York, NY, vol. 11, No. 1, Jan. 1993, pp. 15-19.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Anti-reflective structures does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Anti-reflective structures, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Anti-reflective structures will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3680009

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.