Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2010-03-26
2011-11-22
Picardat, Kevin M (Department: 2822)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S065000, C257S098000
Reexamination Certificate
active
08062915
ABSTRACT:
In this method for producing an anti-reflective film, pores are formed on a surface of a polymer molding material to continuously change a refractive index and then reduce reflectance, in which anodic oxidized porous alumina, in which pores having a tapered shape and whose pore diameter continuously changes, are formed by repeating anodic oxidation at about the same formation voltage and pore diameter enlargement treatment, is used as a mold, or a stamper, which is produced by using the anodic oxidized porous aluminum as a mold, is used as a mold.
REFERENCES:
patent: 6139713 (2000-10-01), Masuda et al.
patent: 7066234 (2006-06-01), Sawitowski
patent: 7129183 (2006-10-01), Mori et al.
patent: 7268948 (2007-09-01), Matsuo et al.
patent: 7713768 (2010-05-01), Masuda et al.
patent: 7835080 (2010-11-01), Taguchi et al.
patent: 2004/0038149 (2004-02-01), Murakami et al.
patent: 2007/0235342 (2007-10-01), Matsuo et al.
patent: H11-291657 (1999-10-01), None
patent: 2002-066337 (2001-03-01), None
patent: 2001-207288 (2001-07-01), None
patent: 2001-213700 (2001-08-01), None
patent: 2002-285382 (2002-10-01), None
patent: 2003-043203 (2003-02-01), None
patent: WO 01/83198 (2001-11-01), None
patent: WO 2006/059686 (2006-06-01), None
Notification, dated Jul. 1, 2008, in JP Appln. 2003-392119.
Office Action (and translation), dated Sep. 18, 2009, issued in JP Appln. 2003-392119.
Kanamori et al., Applied Physics Letters, vol. 78, No. 2, pp. 142-143 (2001).
Masuda et al., Chemistry Letters, pp. 1150-1151 (2002).
Hoyer et al., Thin Solid Films, 286, pp. 88-91 (1996).
Masuda et al., “Fabrication of polymer anti-refractive structure using anodic porous alumina as a template,” Extended Abstracts, 52nd Spring Meeting, 2005, The Japan Society of Applied Physics and Related Society, No. 3, p. 1112, 30p-ZR-9.
Yanagishita et al., “Fabrication of metal mold based on high-regularity porous alumina and application for nano imprint,” The Surface Science Society of Japan, 25th Annual Meeting of the Surface Science Society, Summary, 2005, p. 152, 3C02.
Japanese Office Action dated Dec. 1, 2009.
Japanese Office Action dated Dec. 8, 2009.
Masuda et al., Fabrication of highly ordered anodic porous Al membranes (II), Journal of Aluminium Research, Japan, 1995, No. 2, pp. 49-50.
Brandli et al., Automated synthesis and characterization of diverse libraries of macroporous alumina, Electrochemica Acta 47 (2001), pp. 553-557.
Office Action, Mar. 23, 2010, in JP Appln. 2009-210834 (with translation).
Office Action, Mar. 23, 2010, in JP Appln. 2009-210835 (with translation).
Kawamoto Yasushi
Masuda Hideki
Yasui Kenji
Fitch Even Tabin & Flannery
Kanagawa Academy of Science and Technology
Picardat Kevin M
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