Anti-reflective film and optical element having...

Optical: systems and elements – Having significant infrared or ultraviolet property – Multilayer filter or multilayer reflector

Reexamination Certificate

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C359S588000, C359S586000, C359S589000, C355S071000

Reexamination Certificate

active

11148249

ABSTRACT:
In an anti-reflective film including alternating layers of high refractive-index layers and low refractive-index layers, by designing such that a designed central wavelength λ0is within a wavelength range of 141 nm to 189 nm, and that when the first to eighth layers as counted from a substrate have optical film thicknesses d1to d8respectively, the equations of:in-line-formulae description="In-line Formulae" end="lead"?0.45λ0≦d1≦0.65λ0;in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?0.05λ0≦d2≦0.20λ0;in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?0.29λ0≦d3≦0.49λ0;in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?0.01λ0≦d4≦0.15λ0;in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?0.05λ0≦d5≦0.20λ0;in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?0.23λ0≦d6≦0.28λ0;in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?0.23λ0≦d7≦0.28λ0; andin-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?0.23λ0≦d8≦0.28λ0in-line-formulae description="In-line Formulae" end="tail"?are satisfied, the anti-reflective film can be formed so as to have a low reflectance for a light incident at such a large angle as 30 degrees or more, without increasing the whole thickness of the film.

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M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, K. Sone, S. Niisaka, T. Saito, J. Saito, A. Tanaka, A. Matsumoto, ‘Development of optical coatings for 157-nm lithography. II. Reflectance, absorption, and scatter measurement’, Appl. Opt., vol. 41, No. 16, Jun. 1, 2002, pp. 3248-3255.
A. Matsumoto, A. Tanaka, J. Saito, J. Nagatsuka, T. Saito, S. Niisaka, K. Sone, M. Otani, C. Ouchi, M. Hasegawa, Y. Suzuki, R. Biro, ‘Low loss optical coat for 157 nm lithography’, 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat No. 01EX468), Shimane, Japan, Oct. 31-Nov. 2, 2001, pp. 68-69.

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