Anti-reflection layer of silica matrix with fluorinated polylmer

Details Anti-reflection layer of silica matrix with fluorinated polylmer Anti-reflection layer of silica matrix with fluorinated polylmer

1987-09-23

1988-09-06

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Transfer procedure between image and image layer, image...

Diffusion transfer process, element, or identified image...

430227, 430523, 430535, 430536, 430950, 430961, 430497, 350276R, 428421, 428422, 428446, G03C 554, G03C 178, B32B 2700, B32B 904

Patent

active

047693061

ABSTRACT:
Photographic film units are disclosed which incorporate an anti-reflection layer comprising a matrix of silica having dispersed therein particles of a fluorinated polymer. Viewing of the image and/or photoexposure are effected through the anti-reflection layer.

REFERENCES:
patent: 3047421 (1962-07-01), Taylor
patent: 3793022 (1974-02-01), Land et al.
patent: 3833368 (1974-09-01), Land et al.
patent: 4047804 (1977-09-01), Stephens

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