Anti-reflection high conductivity multi-layer coating on CRT...

Details Anti-reflection high conductivity multi-layer coating on CRT... Anti-reflection high conductivity multi-layer coating on CRT...

2000-05-03

2002-01-08

Henry, Jon (Department: 2872)

Optical: systems and elements

Light interference

Produced by coating or lamina

C359S588000, C427S109000, C427S167000, C313S635000

Reexamination Certificate

active

06337771

ABSTRACT:

BACKGROUND OF THE INVENTION
The present invention relates to a coating process composed of an optically effective layer system, for CRT glass substrate, whereby the layer system has a high anti-reflection and low resistivity effect. More specifically the invention relates to a combination of vacuum sputtering process which produce high conductivity of oxide films and a wet process which produce silica overcoat from traditional spin coating.
U.S. Pat. No. 4,921,760,whose disclosure is an multi-layer anti-reflection coating with excellent adhesion between CeO
2
layer and synthetic resin. The layer system including CeO
2
, Al
2
O
3
, ZrO
2
, SiO
2
, TiO
2
and Ta
2
O
5
. All the thin films of the layer system are produce by vacuum evaporation or sputtering process. There are 3 to 5 thin layers in the layer system. For a given example, the total thickness of the 5 layer structure was about 3580 angstroms. The materials and thickness of the two most thicker films of the 5 layer structure are CeO
2
, 1360 angstroms and SiO
2
, 1220 angstroms respectively.
U.S. Pat. No. 5,105,310, whose disclosure is an multi-layer anti-reflection coating designed for deposition in in-line coating maching by reactive sputtering. The layer system including TiO
2
, SiO
2
, ZnO, ZrO
2
and Ta
2
O
5
. All the thin films of the layer system are produced from vacuum evaporation or sputtering process. There are 4 to 6 thin layers in the layer system. For a given example, the total thickness of the 6 layer structure was about 4700 Angstroms. The materials and thickness of two most thicker film of the layer system are ZnO, 1370 Angstroms and SiO
2
, 1360 Angstroms respectively.
U.S. Pat. No. 5,091,244 and 5,407,733, disclosed a new type electric conductive light-attenuating anti-reflection coating. The major claim is an article comprision of nitrides of certain transition metal to provided an electrically-conductive, light-attenuating, anti-reflection surfaces. The layer systems including TiN, NbN, SnO
2
, SiO
2
, Al
2
O
3
, and Nb
2
O
5
. The thin films of the layer system are nitride and oxide materials. There are 3 to 4 thin layers in the layer system. For a given example, the total thickness of the 4 layer structure was about 1610 Angstroms. The materials and thickness of the two most thicker films of the layer system are ZnO, 650 Angstroms and SiO
2
, 820 Angstroms, respectively. The transmission of visible light of these two layer systems is below 50%. All the thin films of the layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. No. 5,147,125, whose disclosure is a multi-layer, anti-reflection coating using zinc oxide to provide UV rejection for wave-lengths shorter than 380 nm. The layer system including TiO
2
, SiO
2
, ZnO, and MgF
2
. All the thin films of the layer system are produced from vacuum evaporation or sputtering process. There are 4 to 6 thin layers in the layer system. For a given example, the total thickness of the 5 layer structure was about. 7350 Angstroms. The materials and thickness of the two major films of the layer system are Zno, 4390 Angstroms and MgF
2
, 1320 Angstroms, respectively. All the thin films of the layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. No. 5,170,291 disclose a 4 layer system which is optical effective and has a high anti-reflective effect. The layers can be formed by either a pyrolytic method, a plasma-supported chemical vapor deposition met hod, a sputtering method or a chemical deposition method. The layer system including SiO
2
, TiO
2
, Al
2
O
3
, Zns, Mgo and Bi
2
O
3
. For a given sample, the total thickness of the 4 layer structure was about 2480 Angstroms. The materials and thickness of the two major films of the layer system are TiO
2
, 1040 Angstroms and SiO
2
, 940 Angstroms, Respectively.
U.S. Pat. No. 5,216,542 whose disclosure is a 5 layer coating with high anti-reflection effect. The process use an adhesive layer of Ni, Cr or NiCr metal with a thickness about 1 nm (manometer). Other four layers are compose of SnO
2
, ZrO
2
, ZnO, Ta
2
O
5
, NiO, CrO
2
, TiO
2
, Sb
2
O
3
, In
2
O
3
, Al
2
O
3
, SiO
2
, TiN and ZrN. For a given example, the total thickness of the 5 layer structure was about 2337 angstroms. The materials and thickness of the two majority films of the layer system are TiO
2
, 500 Angstroms and SiO
2
, 1387 Angstroms, respectively. The transmission of visible light of this layer system is below 30%. All the thin films of the layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. No. 5,541,770 whose disclosure is a light attenuating anti-reflection coating including electrically conductive layers. It is a four or five layer system. A light absorption high refractive index metal such as Cr, Mo and W was used as a optically effective thin film in the layer system. The other three or four layers are TiO
2
, ITO, Al
2
O
3
, SiO
2
and TiN. The patent shows that the majority materials of the layer system are oxide and nitride, only one metal film was used as an optical effective thin film in the anti-reflection coating. All the thin films of the layer system are produced by vacuum evaporation or sputtering process. For a given example, the total thickness of the 5 layer structure was about 1495 angstroms. The materials and thickness of the majority films of the layer system are ITO, 334 Angstroms and SiO
2
, 720 Angstroms. The transmission of visible light of this layer system is below 60%.
U.S. Pat. No. 5,362,552 whose disclosure is a 6-layer anti-reflection coating includes three layers of electrically-conductive metal oxide. The layer system including SiO
2
, ITO, Nb
2
O
5
, and Ta
2
O
5
. Up to a total optical thickness of about one-wavelength of visible light of the electrically conductive metal oxide may be included in the coating. For one of given example of 6 layer structure, the materials and thickness of the majority two layers within this 6 layer system are SiO
2
, 854 Angstroms and ITO 1975 Angstroms. All the thin films of the layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. No. 5,579,162 whose disclose is a 4-layer anti-reflection coating for a temperature sensitive substrate such as plastic. One layer is a DC reactively sputtered metal oxide which may be deposited quickly and without imparting a large amount of heat to the substrate. The layer system including SnO
2
, SiO
2
and ITO. For one of given example of the 4 layer structure, the materials and thickness of the majority two layers within this system are SnO
2
, 763 Angstroms and SiO
2
940 Angstroms. All the thin films of the layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. Nos. 5,728,456 and 5,783,049, disclosed an improved way to deposit anti-reflection coating on plastic film. The multi-layer thin films was coated by a roller coating with vacuum sputtering process. The layer system including ITO, SiO
2
, and a thin lubricating over layer which is a solvent-soluble fluoropolymer. For a given example, the total thickness of the 6 layer system was about 2630 Angstrom. The materials and thickness of the two major film of the layer system are Ito, 888 Angstrom and SiO
2
, 869 Angstrom.
The above description show clearly that all the films of a layer system with high anti-reflection effect was produced by vacuum evaporation and/or sputtering process. On the other hand, the thickness of the major layer of high refractive index materials in the layer system was between about 700 to 2000 angstrom and the thickness of the major layer of low refractive index materials in the layer system was between about 700 to 1400 angstrom.
SUMMARY OF THE INVENTION
An object of the present invention is to provide an anti-static coating by sputtering process combined with an anti-reflection coating by wet process.
The process of manufacturing transparent conductive oxide thin film in volume production was high reliable and was routinely need in the industries such as semiconductor, display, architecture glass and plastic web coating for

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