Optical: systems and elements – Light interference – Produced by coating or lamina
Reexamination Certificate
2001-01-10
2002-08-27
Henry, Jon (Department: 2872)
Optical: systems and elements
Light interference
Produced by coating or lamina
C359S586000, C359S588000, C359S589000, C359S614000, C428S216000, C313S112000, C313S479000
Reexamination Certificate
active
06441964
ABSTRACT:
FIELD OF THE INVENTION
The present invention relates to a coating process composed of an optically effective layer system, for CRT glass substrate, whereby the layer system has a high anti-reflection, low resistivity, and light-attenuation effect. More specifically the invention relates to a combination of vacuum sputtering process which produce high conductivity of oxide films and a wet process which produce silica overcoat from traditional spin or spray coating.
BACKGROUND OF THE INVENTION
U.S. Pat. No. 4,945,282 discloses an image display panel having anti-static film with transparent and electron-conductive properties and process for processing the same. The layer system includes SnO
2
, In
2
O
3
, Sb
2
O
3
, and SiO
2
. All thin films of the layer system are produce by wet chemical process. There are 2 layers in the layer system. For a given example, the total thickness of the 2-layer structure was up to 2000 angstroms. The materials and thickness of the two films are antistatic coat (SnO
2
, In
2
O
3
, Sb
2
O
3
), 50-800 angstroms and SiO
2
, 1000±200 angstroms respectively.
U.S. Pat. NO. 5,976,684 disclosed is an organic substrate provided with a light absorptive antireflection film and process for its production. The layer system included an organic substrate with acrylic hard coat layer, SiN, TiN and SiO
2
. The thin films of the SiN, TiN and SiO
2
layer are produced by vacuum sputtering process. There are 3 to 4 thin layers in the layer system. For a given example, the total thickness of the 4 layer structure was about 1000 angstroms. The materials and thickness of the two most thicker films of the 4 layer structure are TiN, 20-200 angstroms and SiO
2
, 600-1100 angstroms, respectively.
U.S. Pat. No. 4,921,760 disclosed is an multi-layer anti-reflection coating with excellent adhesion between CeO
2
layer and synthetic resin. The layer system includes CeO
2
, Al
2
O
3
, ZrO
2
, SiO
2
, TiO
2
and Ta
2
O
5
. All the thin films of the layer system are produced by vacuum evaporation or sputtering process. There are 3 to 5 thin layers in the layer system. For a given example, the total thickness of the 5 layer structure was about 3580 angstroms. The materials and thickness of the two most thicker films of the 5 layer structure are CeO
2
, 1360 angstroms and SiO
2
, 1220 angstroms respectively.
U.S. Pat. No. 5,105,310 disclosed a multi-layer anti-reflection coating designed for deposition in in-line coating marching by reactive sputtering. The layer system included TiO
2
, SiO
2
, ZnO, ZrO
2
and Ta
2
O
5
. All the thin films of the layer system are produced from vacuum evaporation or sputtering process. There are 4 to 6 thin layers in the layer system. For a given example, the total thickness of the 6 layer structure was about 4700 Angstroms. The materials and thickness of two most thicker film of the layer system are ZnO, 1370 Angstroms and SiO
2
, 1360 Angstroms respectively.
U.S. Pat. Nos. 5,091,244 and 5,407,733 disclosed a new electric conductive light-attenuating anti-reflection coating. The major claim is an article comprising nitrides of certain transition metal to provided an electrically-conductive, light-attenuating, anti-reflection surfaces. The layer systems including TiN, NbN, SnO
2
, SiO
2
, Al
2
O
3
, and Nb
2
O
5
. The thin films of the layer system are nitride and oxide materials. There are 3 to 4 thin layers in the layer system. For a given example, the total thickness of the 4 layer structure was about 1610 Angstroms. The materials and thickness of the two most thicker films of the layer system are ZnO, 650 Angstroms and SiO
2
, 820 Angstroms, respectively. The transmission of visible light of these two layer systems is below 50%. All the thin films of the layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. No. 5,147,125 disclosed a multi-layer, anti-reflection coating using zinc oxide to provide UV rejection for wave-lengths shorter than 380 nm. The layer system includes TiO
2
, SiO
2
, ZnO, and MgF
2
. All the thin films of the layer system are produced from vacuum evaporation or sputtering process. There are 4 to 6 thin layers in the layer system. For a given example, the total thickness of the 5 layer structure was about. 7350 Angstroms. The materials and thickness of the two major films of the layer system are ZnO, 4390 Angstroms and MgF
2
, 1320 Angstroms, respectively. All the thin films of the layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. No. 5,170,291 disclose a 4 layer system which is optical effective and has a high anti-reflective effect. The layers can be formed by either a pyrolytic method, a plasma-supported chemical vapor deposition method, a sputtering method or a chemical deposition method. The layer system includes SiO
2
, TiO
2
, Al
2
O
3
, ZnS, MgO and Bi
2
O
3
For a given sample, the total thickness of the 4 layer structure was about 2480 Angstroms. The materials and thickness of the two major films of the layer system are TiO
2
, 1040 Angstroms and SiO
2
, 940 Angstroms, Respectively.
U.S. Pat. No. 5,216,542 disclosed a 5 layer coating with high anti-reflection effect. The process uses an adhesive layer of Ni, Cr or NiCr metal with a thickness about 1 nm (manometer). Other four layers are composed of SnO
2
, ZrO
2
, ZnO, Ta
2
O
5
, NiO, CrO
2
, TiO
2
, Sb
2
O
3
, In
2
O
3
, Al
2
O
3
,SiO
2
, TiN and ZrN. For a given example, the total thickness of the 5 layer structure was about 2337 angstroms. The materials and thickness of the two majority films of the layer system are TiO
2
, 500 Angstroms and SiO
2
, 1387 Angstroms, respectively. The transmission of visible light of this layer system is below 30%. All the thin films of the layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. No. 5,541,770 disclosed a light attenuating anti-reflection coating including electrically conductive layers. It is a four or five layer system. A light absorption high refractive index metal such as Cr, Mo and W was used as an optically effective thin film in the layer system. The other three or four layers are TiO
2
, ITO, Al
2
O
3
, SiO
2
and TiN. The patent shows that the majority materials of the layer system are oxide and nitride, only one metal film was used as an optical effective thin film in the anti-reflection coating. All the thin films of the layer system are produced by vacuum evaporation or sputtering process. For a given example, the total thickness of the 5 layer structure was about 1495 angstroms. The materials and thickness of the majority films of the layer system are ITO, 334 Angstroms and SiO
2
, 720 Angstroms. The transmission of visible light of this layer system is below 60%.
U.S. Pat. No. 5,362,552 disclosed a 6-layer anti-reflection coating including three layers of electrically- conductive metal oxide. The layer system includes SiO
2
, ITO, Nb
2
O
5
, and Ta
2
O
5
. Up to a total optical thickness of about one-wavelength of visible light of the electrically conductive metal oxide may be included in the coating. For one of given example of 6 layer structure, the materials and thickness of the majority two layers within this 6 layer system are SiO
2
, 854 Angstroms and ITO 1975 Angstroms. All the thin films of the layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. No. 5,579,162 disclosed a 4-layer anti-reflection coating for a temperature sensitive substrate such as plastic. One layer is a DC reactively sputtered metal oxide which may be deposited quickly and without imparting a large amount of heat to the substrate. The layer system including SnO
2
, SiO
2
and ITO. For one of given example of the 4 layer structure, the materials and thickness of the majority two layers within this system are SnO
2
, 763 Angstroms and SiO
2
940 Angstroms. All the thin films of the layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. Nos. 5,728,456 and 5,783,049 discloses an improved way to deposit anti-reflection coating on plastic film. The multi-layer thin films was coated by a rolle
Chang Shao Chi
Chu Jau-Jier
Li Chao-Sung
Shih Cheng Chen
Applied Vacuum Coating Technologies Co., Ltd.
Henry Jon
Rosenberg , Klein & Lee
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