Anti-reflection film for synthetic resin base

Details Anti-reflection film for synthetic resin base Anti-reflection film for synthetic resin base

1977-06-22

1980-04-01

Lesmes, George F.

Stock material or miscellaneous articles

Structurally defined web or sheet

Including components having same physical characteristic in...

350164, 350165, 350166, 427164, 427166, 428448, 428336, 428451, 428913, B32B 2706, G02B 110

Patent

active

041962460

ABSTRACT:
Anti-reflection film for a synthetic resin base comprises a first layer of silicon dioxide (SiO.sub.2) deposited on the synthetic resin base by evaporation, a second layer of alumina (Al.sub.2 O.sub.3) deposited on the first layer by evaporation, and a third layer of silicon dioxide (SiO.sub.2) or magnesium fluoride (MgF.sub.2) deposited on the second layer by evaporation. The first layer has a geometrical film thickness of 1 to 5 .mu., the second layer has an optical film thickness of .lambda./4, and the third layer has an optical film thickness of .lambda./4.

REFERENCES:
patent: 3781090 (1963-12-01), Sumita
patent: 3799653 (1974-03-01), Ikeda
patent: 3854796 (1974-12-01), Thelen
patent: 3914023 (1975-10-01), Thelen
patent: 3984581 (1976-10-01), Dobler et al.

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