Anti-fuse cell and its manufacturing process

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics

Reexamination Certificate

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Details

C438S598000, C438S132000, C438S281000, C257S209000, C257SE23147

Reexamination Certificate

active

07989914

ABSTRACT:
An anti-fuse cell includes a standard MOS transistor of an integrated circuit, with source and drain regions covered with a metal silicide layer and at least one track of a resistive layer at least partially surrounding the MOS transistor, and adapted to pass a heating current such that the metal of said metal silicide diffuses across drain and/or source junctions.

REFERENCES:
patent: 5019878 (1991-05-01), Yang et al.
patent: 5298784 (1994-03-01), Gambino et al.
patent: 2003/0201514 (2003-10-01), Radens et al.
patent: 2004/0152262 (2004-08-01), Ichige et al.
patent: 2004/0233768 (2004-11-01), Kothandaraman
patent: 2005/0067670 (2005-03-01), Hui
patent: 2006/0079086 (2006-04-01), Boit et al.
International Search Report from corresponding International Application No. PCT/EP2005/057150, filed Dec. 23, 2005.

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