Anti-contaminating adsorbed film covalently bonded to a substrat

Details Anti-contaminating adsorbed film covalently bonded to a substrat Anti-contaminating adsorbed film covalently bonded to a substrat

1991-12-24

1994-02-08

Thibodeau, Paul J.

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Web or sheet containing structurally defined element or...

Physical dimension specified

428429, 428447, 428452, 428688, B32B 1706

Patent

active

052847071

ABSTRACT:
This invention provides for an anti-contaminating film which is adsorbed to a substrate surface. The film contains a --Si-- group and fluorocarbon group. The --Si-- group is covalently bonded to the substrate surface. It also provides a method of forming an anti-contaminating film on a hydrogen active substrate surface by contacting the substrate surface with a non-aqueous solution, containing a surface active material having fluorocarbon groups and chlorosilane groups, the substrate surface having active hydrogen groups, removing unreacted surface active material remaining on the substrate by washing the substrate with a non-aqueous organic solution for making a monomolecular precursor film, reacting chlorosilane groups unreacted in the adsorbed monomolecular precursor film with water after the removing step, and drying the adsorbed monomolecular film. The above washing step with the non-aqueous organic solution was omitted, and a fluorocarbon polymer film was formed to the substrate surface.

REFERENCES:
patent: 4539061 (1985-09-01), Sagiv
patent: 4863794 (1989-09-01), Fujii
patent: 4902585 (1990-02-01), Ogawa et al.
patent: 5010356 (1991-04-01), Albinson
World Patents Index Latest, Derwent Publications Ltd., London, GB; AN 86-065417 & JP-A-61 016 910 (Hitachi Cable KK), Jan. 24, 1986 (abstract).

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